Surface reactivity measurements for OH radicals during deposition of SiO2 from tetraethoxysilane/O2 plasmas
K.H.A. Bogart, J.P. Cushing, Ellen R. FisherVolume:
267
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0009-2614(97)00109-7
File:
PDF, 513 KB
english, 1997