SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
Rao, Veena, Hinsberg, William D., Frank, Curtis W., Pease, Roger Fabian W., Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175373
File:
PDF, 413 KB
english, 1994