Effect of Growth Temperature on Cobalt-Doped TiO2 Thin...

Advanced Materials Research 2014 / 2 Vol. 896

Effect of Growth Temperature on Cobalt-Doped TiO2 Thin Films Deposited on Si (100) Substrate by MOCVD Technique

Saripudin, Aip, Saragih, H., Khairurrijal,, Khairurrijal,, Arifin, Pepen
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Volume:
896
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.896.192
Date:
February, 2014
File:
PDF, 771 KB
english, 2014
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