The formation of etch hillocks during step-flow etching of Si(111)
Jaroslav Flidr, Yi-Chiau Huang, Theresa A. Newton, Melissa A. HinesVolume:
302
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0009-2614(99)00121-9
File:
PDF, 953 KB
english, 1999