Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor
Kim, Hangil, Lee, Min Young, Kim, Soo-Hyun, Bae, So Ik, Ko, Kyung Yong, Kim, Hyungjun, Kwon, Kyeong-Woo, Hwang, Jin-Ha, Lee, Do-JoongVolume:
349
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.05.062
Date:
September, 2015
File:
PDF, 1.03 MB
english, 2015