A Physical Model for Dishing during Metal CMP

Journal of The Electrochemical Society 2003 Vol. 150; Iss. 11

A Physical Model for Dishing during Metal CMP

Nguyen, Viet H., Daamen, Roel, van Kranenburg, Herma, van der Velden, Peter, Woerlee, Pierre H.
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Volume:
150
Year:
2003
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1611497
File:
PDF, 650 KB
english, 2003
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