Nanocrystalline Diamond Films Deposited by Two-Step Approach from CH4/H2 Microwave Plasma: The Influence of Reactor Pressure
Khlayboonme, S.T., Thowladda, W.Volume:
339
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.339.657
Date:
July, 2013
File:
PDF, 4.51 MB
english, 2013