Mechanisms for Defect Creation and Removal in Hydrogenated...

Mechanisms for Defect Creation and Removal in Hydrogenated and Deuterated Amorphous Silicon Studied using Thin Film Transistors

Flewitt, Andew, Lin, Shufan, Milne, William I, Wehrspohn, Ralf B, Powell, Martin J
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Volume:
910
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0910-A19-01
Date:
January, 2006
File:
PDF, 373 KB
english, 2006
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