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Effect of Dopants on the Dissolution Behavior of Silicon Substrates in HF-Based Cleaning Solutions
Abu Jeriban, Salima, Guiot, Ivette, Bacherius, Luc, Proost, Joris, Sleeckx, Erik, Vos, Rita, Mertens, Paul W.Volume:
134
Year:
2008
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.134.139
File:
PDF, 272 KB
english, 2008