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Correlation Between Annealing Temperature and Crystallinity of Si Films Prepared by Thermal Plasma Jet Crystallization Technique
Kaku, Hirotaka, Higashi, Seiichiro, Okada, Tatsuya, Murakami, Hideki, Miyazaki, SeiichiVolume:
910
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0910-A21-18
Date:
January, 2006
File:
PDF, 243 KB
english, 2006