Correlation between Schottky Contact Characteristics and Regions with a Low Barrier Height Revealed by the Electrochemical Deposition on 4H-SiC
Kato, Masashi, Ono, H., Ichimura, MasayaVolume:
645-648
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.645-648.669
Date:
April, 2010
File:
PDF, 677 KB
english, 2010