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[ECS 208th ECS Meeting - Los Angeles, California (October 16-October 21, 2005)] ECS Transactions - Prospect of Hf-Based Gate Dielectric by PVD with FUSI Gate for LSTP Application
Niwa, Masaaki, Mitsuhashi, Riichirou, Hayashi, Shigenori, Yamamoto, Kazuhiko, Harada, Yoshinao, Kubota, Masafumi, Rothchild, Aude, Hoffmann, Thomas, Kubicek, Stefan, De Gendt, S., Heyns, Marc, LauwersVolume:
1
Year:
2006
Language:
english
DOI:
10.1149/1.2209276
File:
PDF, 2.23 MB
english, 2006