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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Bottom antireflective coatings (BARCs) for 157-nm lithography
He, Liu, Puligadda, Rama, Lowes, Joyce, Rich, Michael D., Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485334
File:
PDF, 500 KB
english, 2003