Precursor flow rate manipulation for the controlled...

Nanotechnology 2012 / 10 Vol. 23; Iss. 41

Precursor flow rate manipulation for the controlled fabrication of twin-free GaAs nanowires on silicon substrates

Kang, J H, Gao, Q, Parkinson, P, Joyce, H J, Tan, H H, Kim, Y, Guo, Y, Xu, H, Zou, J, Jagadish, C
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Volume:
23
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/23/41/415702
Date:
October, 2012
File:
PDF, 3.36 MB
english, 2012
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