Multilayer Masking Technique for Deep Isotropic Silicon Wet...

Multilayer Masking Technique for Deep Isotropic Silicon Wet Etching

Nie, Lei, Yu, Jun Xing, Zhang, Kun
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Volume:
229-231
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.229-231.2444
Date:
November, 2012
File:
PDF, 444 KB
english, 2012
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