Highly Selective Photoresist Ashing by Addition of Ammonia...

Journal of The Electrochemical Society 2001 Vol. 148; Iss. 2

Highly Selective Photoresist Ashing by Addition of Ammonia to Plasma Containing Carbon Tetrafluoride

Saito, Makoto, Eto, Hideo, Omiya, Kayoko, Homma, Tetsuya, Nagatomo, Takao
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Volume:
148
Year:
2001
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1339870
File:
PDF, 350 KB
english, 2001
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