Low Temperature Chemical Vapor Deposition of Silicon-rich...

International Journal of Chemical Reactor Engineering 2012 / 01 Vol. 10; Iss. 1

Low Temperature Chemical Vapor Deposition of Silicon-rich Tungsten Silicide Films from Tungsten Hexafluoride - Disilane Pre-activated Mixtures

Saito, Takeyasu, Oshima, Keiji, Shimogaki, Yukihiro, Egashira, Yasuyuki, Sugawara, Katsuro, Takahiro, Katsumi, Nagata, Shinji, Yamaguchi, Sadae, Komiyama, Hiroshi
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Volume:
10
Language:
english
Journal:
International Journal of Chemical Reactor Engineering
DOI:
10.1515/1542-6580.2666
Date:
January, 2012
File:
PDF, 945 KB
english, 2012
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