Nickel deposition behavior on n-type silicon wafer for...

Electrochimica Acta 2000 Vol. 45; Iss. 20

Nickel deposition behavior on n-type silicon wafer for fabrication of minute nickel dots

Nao Takano, Daisuke Niwa, Taro Yamada, Tetsuya Osaka
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Volume:
45
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0013-4686(00)00442-4
File:
PDF, 846 KB
english, 2000
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