Three-Step Room-Temperature Cleaning of Bare Silicon...

Journal of The Electrochemical Society 2009 Vol. 156; Iss. 1

Three-Step Room-Temperature Cleaning of Bare Silicon Surface for Radical-Reaction-Based Semiconductor Manufacturing

Hasebe, Rui, Teramoto, Akinobu, Kuroda, Rihito, Suwa, Tomoyuki, Sugawa, Shigetoshi, Ohmi, Tadahiro
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Volume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2993153
File:
PDF, 704 KB
english, 2009
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