Nickel electroless deposition process on chemically pretreated Si(100) wafers in aqueous alkaline solution
Daisuke Niwa, Nao Takano, Taro Yamada, Tetsuya OsakaVolume:
48
Year:
2003
Language:
english
Pages:
6
DOI:
10.1016/s0013-4686(02)00838-1
File:
PDF, 553 KB
english, 2003