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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Customized illumination aperture filter for low k1 photolithography process
Gau, Tsai-Sheng, Liu, Ru-Gun, Chen, Chun-Kuang, Lai, Chih-Ming, Liang, Fu-Jye, Hsia, Chin C., Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389016
File:
PDF, 2.73 MB
english, 2000