p-Type Ion Implantation in Tensile Si∕Compressive Si0.5Ge0.5∕Tensile Strained Si Heterostructures
Minamisawa, R. A., Buca, D., Holländer, B., Hartmann, J. M., Bourdelle, K. K., Mantl, S.Volume:
159
Year:
2012
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/2.060201jes
File:
PDF, 550 KB
english, 2012