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Formation of SiOF Films by APCVD Using TEOS-O3-HF Gas Mixture
Pacio, Mauricio, Juárez, H., Díaz-Becerril, T., Rosendo-Andrés, E., García-Salgado, G., Escalante, G., Ramirez, G.Volume:
9
Language:
english
Journal:
Journal of Nano Research
DOI:
10.4028/www.scientific.net/JNanoR.9.39
Date:
February, 2010
File:
PDF, 354 KB
english, 2010