Effect of oxidized silicon surface on chemical deposition of nickel on n-type silicon wafer
Nao Takano, Naohiro Hosoda, Taro Yamada, Tetsuya OsakaVolume:
44
Year:
1999
Language:
english
Pages:
7
DOI:
10.1016/s0013-4686(99)00079-1
File:
PDF, 194 KB
english, 1999