Photoresist and Fluorocarbon Postplasma Etch Residue...

Journal of The Electrochemical Society 2008 Vol. 155; Iss. 10

Photoresist and Fluorocarbon Postplasma Etch Residue Removal Using Electrochemically Generated Radical Anions

Timmons, Christopher L., Hess, Dennis W.
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Volume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2965533
File:
PDF, 652 KB
english, 2008
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