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Trimethylchlorosilane Treatment of Ultralow Dielectric Constant Material after Photoresist Removal Processing
Chang, T. C., Mor, Y. S., Liu, P. T., Tsai, T. M., Chen, C. W., Chu, C. J., Pan, F. M., Lur, W., Sze, S. M.Volume:
149
Year:
2002
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1504456
File:
PDF, 99 KB
english, 2002