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Evaluation of Damages and Pore-sealing Capabilities of Oxidizing and Reducing Etch Plasmas for Single and Dual Damascene Patterning of Porous Ultra-Low-k Materials
Ollier, Emmanuel, Clain, Mathieu, Fox, Robert, Brun, Philippe, Jullian, StephaneVolume:
914
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0914-F04-05
Date:
January, 2006
File:
PDF, 355 KB
english, 2006