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Computational Study on Polymer Filling Process in Nanoimprint Lithography for Bi-Layered Resist
Araki, Kosei, Yasuda, Masaaki, Horiba, Akira, Kawata, Hiroaki, Hirai, YoshihikoVolume:
1499
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2013.413
Date:
January, 2013
File:
PDF, 4.80 MB
english, 2013