Boron Incorporation and Its Effect on Electronic Properties of Ge:H Films Deposited by LF Plasma
Kosarev, Andrey, Torres, Alfonso J, Checa, Nery D, Kudriavtsev, Yurii, Asomoza, Rene, Hernandez, Salvador GVolume:
1066
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1066-A05-04
Date:
January, 2008
File:
PDF, 179 KB
english, 2008