ALD Refill of Nanometer-Scale Gaps with High-κ Dielectric for Advanced CMOS Technologies
Lee, Donovan, Seidel, Thomas, Dalton, Jeremie, King Liu, Tsu-JaeVolume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2749331
File:
PDF, 391 KB
english, 2007