High-Reliability Ta[sub 2]O[sub 5] Metal–Insulator–Metal Capacitors with Cu-Based Electrodes
Tsai, Kou-Chiang, Wu, Wen-Fa, Chao, Chuen-Guang, Kuan, Cheng-PingVolume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2185283
File:
PDF, 447 KB
english, 2006