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Using Perturbation FEM Compute the IC Interconnect Parasitic Capacitances Considering Process Variation
Qu, Hui, Xu, Xiao Yu, Ren, Zhuo XiangVolume:
301-303
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.301-303.303
Date:
July, 2011
File:
PDF, 290 KB
english, 2011