High Tensile Stress with Minimal Dopant Diffusion by Low...

Electrochemical and Solid-State Letters 2011 Vol. 14; Iss. 5

High Tensile Stress with Minimal Dopant Diffusion by Low Temperature Microwave Anneal

Lee, Yao-Jen, Lu, Yu-Lun, Mu, Zheng-Chang, Hsueh, Fu-Kuo, Chao, Tien-Sheng, Wu, Ching-Yi
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Volume:
14
Year:
2011
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3536462
File:
PDF, 469 KB
english, 2011
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