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Post-Plasma-Etch Residue Removal Using CO[sub 2]-Based Fluids
Myneni, Satyanarayana, Hess, Dennis W.Volume:
150
Year:
2003
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1621879
File:
PDF, 731 KB
english, 2003