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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - The impacts of scanner modeling parameters for OPC model of sub-40nm memory device
Kim, Cheol-Kyun, Jang, Jong-won, Jeon, Jinhyuck, Park, Chan-ha, Yang, Hyun-jo, Yim, Donggyu, Park, Sungki, Dusa, Mircea V., Conley, WillVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846710
File:
PDF, 1.38 MB
english, 2010