Electrical Characteristics of Fluorine Passivated...

Key Engineering Materials 2008 Vol. 368-372

Electrical Characteristics of Fluorine Passivated MOCVD-TiO2 Film on (NH4)2Sx Treated GaAs

Lee, Ming Kwei, Yen, Chih Feng, Shih, Tsung Hsiang, Ho, Chen Lia, Lee, Hung Chang, Tu, Hwai Fu, Fan, Cho Han
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Volume:
368-372
Year:
2008
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.368-372.232
File:
PDF, 1.71 MB
english, 2008
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