Moisture Barrier Properties of Al 2...

Japanese Journal of Applied Physics 2013 / 03 Vol. 52; Iss. 3R

Moisture Barrier Properties of Al 2 O 3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures

Choi, Hagyoung, Lee, Sanghun, Jung, Hyunsoo, Shin, Seokyoon, Ham, Giyul, Seo, Hyungtak, Jeon, Hyeongtag
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.035502
Date:
March, 2013
File:
PDF, 1001 KB
english, 2013
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