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Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO[sub 2] Dielectric Films by In Situ NH[sub 3] Injection
Kim, Jeong Hwan, Park, Tae Joo, Cho, Moonju, Jang, Jae Hyuck, Seo, Minha, Na, Kwang Duk, Hwang, Cheol Seong, Won, Jeong YeonVolume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3098978
File:
PDF, 689 KB
english, 2009