Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2012 Vol. 30; Iss. 6
Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale magnetic tunnel junctions
Chun, Sung-Woo, Kim, Daehong, Kwon, Jihun, Kim, Bongho, Lee, Hyungyu, Lee, Seung-BeckVolume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4767123
File:
PDF, 1.67 MB
english, 2012