Surface and interface studies of RF sputtered HfO2 thin...

Journal of Materials Science: Materials in Electronics 2015 / 8 Vol. 26; Iss. 8

Surface and interface studies of RF sputtered HfO2 thin films with working pressure and gas flow ratio

Das, K. C., Ghosh, S. P., Tripathy, N., Bose, G., Ashok, A., Pal, P., Kim, D. H., Lee, T. I., Myoung, J. M., Kar, J. P.
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Volume:
26
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-015-3179-9
Date:
August, 2015
File:
PDF, 1.46 MB
english, 2015
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