The role of oxygen plasma in the formation of oxygen defects in HfO x films deposited at room temperature
Januar, Mochamad, Prakoso, Suhendro Purbo, Lan, Sen-Yao, Mahanty, Rama Krushna, Kuo, Shou-Yi, Liu, Kou-ChenVolume:
3
Year:
2015
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/c4tc02838d
File:
PDF, 4.67 MB
english, 2015