A high performance HfSiON/TaN NMOSFET fabricated using a...

Chinese Physics B 2013 / 11 Vol. 22; Iss. 11

A high performance HfSiON/TaN NMOSFET fabricated using a gate-last process

Xu, Gao-Bo, Xu, Qiu-Xia, Yin, Hua-Xiang, Zhou, Hua-Jie, Yang, Tao, Niu, Jie-Bin, Yu, Jia-Han, Li, Jun-Feng, Zhao, Chao
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Volume:
22
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/22/11/117309
Date:
November, 2013
File:
PDF, 695 KB
english, 2013
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