Microtrenching effect of SiC ICP etching in SF 6 /O 2 plasma
Ruixue, Ding, Yintang, Yang, Ru, HanVolume:
30
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/30/1/016001
Date:
January, 2009
File:
PDF, 659 KB
english, 2009