Application of mechanical stress for studying the interface...

Proceedings of the IEEE 1971 Vol. 59; Iss. 2

Application of mechanical stress for studying the interface properties of the Si-SiO2system

Sivo, L.L.
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Volume:
59
Year:
1971
Language:
english
Journal:
Proceedings of the IEEE
DOI:
10.1109/proc.1971.8160
File:
PDF, 267 KB
english, 1971
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