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Thermal Behavior of Residual Defects in Low-Dose Arsenic- and Boron-Implanted Silicon After High-Temperature Rapid Thermal Annealing
Sagara, Akihiko, Uedono, Akira, Shibata, SatoshiVolume:
28
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2014.2373636
Date:
February, 2015
File:
PDF, 528 KB
english, 2015