Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2008 Vol. 26; Iss. 1
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Mechanistic study of plasma damage of low k dielectric surfaces
Bao, J., Shi, H., Liu, J., Huang, H., Ho, P. S., Goodner, M. D., Moinpour, M., Kloster, G. M.Volume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2834562
File:
PDF, 685 KB
english, 2008