Development of plasma etching processes to pattern...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 09 Vol. 32; Iss. 5

Development of plasma etching processes to pattern sub-15 nm features with PS-b-PMMA block copolymer masks: Application to advanced CMOS technology

Delalande, Michaël, Cunge, Gilles, Chevolleau, Thierry, Bézard, Philippe, Archambault, Sophie, Joubert, Olivier, Chevalier, Xavier, Tiron, Raluca
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4895334
Date:
September, 2014
File:
PDF, 4.62 MB
english, 2014
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