Fabrication of 200 nm period nanomagnet arrays using...

Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist

Farhoud, Maya, Ferrera, Juan, Lochtefeld, Anthony J., Murphy, T. E., Schattenburg, Mark L., Carter, J., Ross, C. A., Smith, Henry I.
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Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.590976
File:
PDF, 832 KB
english, 1999
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