Double patterning with dual hard mask for 28-nm node devices and below
Hody, Hubert, Paraschiv, Vasile, Vecchio, Emma, Locorotondo, Sabrina, Winroth, Gustaf, Athimulam, Raja, Boullart, WernerVolume:
12
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.12.4.041306
Date:
October, 2013
File:
PDF, 1.46 MB
english, 2013