SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - PS-b-PHEMA: synthesis, characterization, and processing of a high χ polymer for directed self-assembly lithography
Cheng, Jing, Tong, William M., Resnick, Douglas J., Lawson, Richard A., Yeh, Wei-Ming, Jarnagin, Nathan D., Tolbert, Laren M., Henderson, Clifford L.Volume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2021417
File:
PDF, 698 KB
english, 2013